Tin laser-produced plasma as the light source for extreme ultraviolet lithography high-volume manufacturing: history, ideal plasma, present status, and prospects
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Analysis, simulation, and experimental studies of YAG and CO2 laser- produced plasma for EUV lithography sources
Efficient laser systems are essential for the realization of high volume manufacturing in extreme ultraviolet lithography (EUVL). Solid-state Nd:YAG lasers usually have lower efficiency and source suppliers are alternatively investigating the use of high power CO2 laser systems. However, CO2 laser-produced plasmas (LPP) have specific characteristics and features that should be taken into accoun...
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The laser plasma is one of the major contenders as a high-power source for future high-volume-manufacturing extreme ultraviolet lithography systems. Such laser–plasma sources require a target system that allows high-repetition-rate operation with low debris and manageable thermal load at the required high laser power. In this paper, we review the development of the liquid-jet target laser plasm...
متن کاملModeling of EUV Emission and Conversion Efficiency from Laser-Produced Tin Plasmas for Nanolithography
Extreme ultraviolet lithography (EUVL) is a leading candidate for use in next-generation high volume manufacturing of semiconductor chips that require feature sizes less than 32 nm. The essential requirement for enabling this technology is to have a reliable, clean and powerful EUV source which efficiently emits light at a wavelength of 13.5 nm. Laserproduced plasma EUV sources are strong candi...
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Laser-produced plasma (LPP) devices have been modeled as the light source for extreme ultraviolet (EUV) lithography. A key challenge for LPP is achieving sufficient brightness to support the throughput requirements of high-volume manufacturing. An integrated model (HEIGHTS) was applied to simulate the environment of EUV sources and optimize their output. The model includes plasma evolution and ...
متن کاملEffects of Plasma Spatial Profile on Conversion Efficiency of Laser Produced Plasma Sources for EUV Lithography
Extreme ultraviolet (EUV) lithography devices that use laser produced plasma (LPP), discharge produced plasma (DPP), and hybrid devices need to be optimized to achieve sufficient brightness with minimum debris generation to support the throughput requirements of High-Volume Manufacturing (HVM) lithography exposure tools with long lifetime. Source performance, debris mitigation, and reflector sy...
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